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Magnetron sputtered nickel oxide with suppressed interfacial defect states for efficient inverted perovskite solar cells 认领 引用
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作者 Guoqiang Ma Qin Tan +8 位作者 Zhaoning Li Jingwei Xiu Jiafeng Wang Tianle Cheng Dong He Qiang Sun Xuhang Ma Francesco Lamberti Zhubing He 《Journal of Energy Chemistry》 SCIE EI CAS CSCD 2025年第1期348-355,共8页
Widely used spin-coated nickle oxide (NiOx) based perovskite solar cells often suffer from severe interfacial reactions between the NiOxand adjacent perovskite layers due to surface defect states,which inherently impa... Widely used spin-coated nickle oxide (NiOx) based perovskite solar cells often suffer from severe interfacial reactions between the NiOxand adjacent perovskite layers due to surface defect states,which inherently impair device performance in a long-term view,even with surface molecule passivation.In this study,we developed high-quality magnetron-sputtered NiOxthin films through detailed process optimization,and compared systematically sputtered and spin-coated NiOxthin film surfaces from materials to devices.These sputtered NiOxfilms exhibit improved crystallinity,smoother surfaces,and significantly reduced Ni3+or Ni vacancies compared to their spin-coated counterparts.Consequently,the interface between the perovskite and sputtered NiOxfilm shows a substantially reduced density of defect states.Perovskite solar cells (PSCs) fabricated with our optimally sputtered NiOxfilms achieved a high power conversion efficiency (PCE) of up to 19.93%and demonstrated enhanced stability,maintaining 86.2% efficiency during 500 h of maximum power point tracking under one standard sun illumination.Moreover,with the surface modification using (4-(2,7-dibromo-9,9-dimethylacridin-10(9H)-yl)butyl)p hosphonic acid (DMAcPA),the device PCE was further promoted to 23.07%,which is the highest value reported for sputtered NiOxbased PSCs so far. 展开更多
关键词 Nickle oxide Magnetron sputter Defect Stability Perovskite solar cell
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Constructing high-entropy spinel oxide thin films via magnetron sputtering for efficiently electrocatalyzing alkaline oxygen evolution reaction 认领 引用
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作者 Yuhui Chen Congbao Guo +2 位作者 Yi Wang Kun Wang Shuqin Song 《Chinese Journal of Catalysis》 SCIE EI CAS CSCD 2025年第10期210-219,共10页
Ensuring high electrocatalytic performance simultaneously with low or even no precious-metal usage is still a big challenge for the development of electrocatalysts toward oxygen evolution reaction(OER)in anion exchang... Ensuring high electrocatalytic performance simultaneously with low or even no precious-metal usage is still a big challenge for the development of electrocatalysts toward oxygen evolution reaction(OER)in anion exchange membrane water electrolysis.Here,homogeneous high entropy oxide(HEO)film is in-situ fabricated on nickel foam(NF)substrate via magnetron sputtering technology without annealing process in air,which is composed of many spinel-structured(FeCoNiCrMo)3O4 grains with an average particle size of 2.5 nm.The resulting HEO film(abbreviated as(FeCoNiCr-Mo)3O4)exhibits a superior OER performance with a low OER overpotential of 216 mV at 10 mA cm–2 and steadily operates at 100 mA cm–2 for 200 h with a decay of only 272μV h–1,which is far better than that of commercial IrO2 catalyst(290 mV,1090μV h–1).Tetramethylammonium cation(TMA+)probe experiment,activation energy analysis and theoretical calculations unveil that the OER on(FeCoNiCrMo)3O4 follows an adsorbate evolution mechanism pathway,where the energy barrier of rate-determining step for OER on(FeCoNiCrMo)3O4 is substantially lowered.Also,methanol molecular probe experiment suggests that a weakened *OH bonding on the(FeCoNiCrMo)3O4 surface and a rapid deprotonation of *OH,further enhancing its OER performance.This work provides a feasible solution for designing efficient high entropy oxides electrocatalysts for OER,accelerating the practical process of water electrolysis for H2 production. 展开更多
关键词 High entropy spinel oxide Magnetron sputtering Alkaline water electrolysis Oxygen evolution reaction
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Influence of sputtering gases on the properties of Mg-doped NiO thin films prepared by radio-frequency magnetron co-sputtering method 认领 引用
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作者 WANG Xin LUO Minghai +2 位作者 CONG Fanchao CHEN Yili XIA Jinghan 《Optoelectronics Letters》 EI 2025年第12期716-719,共4页
By doping with Mg atoms,the bandgap of Mg-doped NiO thin films can be adjusted larger.By using NiO and MgO as sputtering targets,Mg-doped NiO thin films were deposited using radio-frequency magnetron co-sputtering met... By doping with Mg atoms,the bandgap of Mg-doped NiO thin films can be adjusted larger.By using NiO and MgO as sputtering targets,Mg-doped NiO thin films were deposited using radio-frequency magnetron co-sputtering method in pure argon and pure oxygen gas,respectively.The crystal structure,morphological characteristics,composition and optical properties of the obtained films were compared by X-ray diffraction(XRD),scanning electron microscope(SEM),energy dispersive spectrometer(EDS)and ultraviolet(UV)-visible spectrophotometer.The properties of the thin films deposited in different sputtering gases are quite different.For the films deposited in pure argon gas,it is a polycrystalline thin film with(200)preferred orientation,while the film deposited in pure oxygen has no preferred orientation.The grain size,molar ratio of Mg to Ni atoms and optical bandgap are larger for the films deposited in pure argon gas than those deposited in oxygen gas. 展开更多
关键词 dispersive spectrometer eds crystal structuremorphological sputtering targetsmg doped oxygen gasrespectivelythe Mg doped NiO thin films radio frequency magnetron co sputtering bandgap sputtering gases
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Characteristics of radio-frequency magnetron sputtering with Ag target operated near the electron series resonance oscillation 认领 引用
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作者 Chao YE 《Plasma Science and Technology》 SCIE EI CSCD 2025年第3期111-117,共7页
The discharge and plasma characteristics of Ag magnetron sputtering discharge operated near the electron series resonance(ESR)oscillation,which was excited using the driving frequency of 27.12 MHz,was investigated.The... The discharge and plasma characteristics of Ag magnetron sputtering discharge operated near the electron series resonance(ESR)oscillation,which was excited using the driving frequency of 27.12 MHz,was investigated.The imaginary part of impedance was found to undergo a transition from capacitive to inductive on varying radio-frequency(RF)power,and the conditions for the ESR excitation were satisfied.The current–voltage(I–V)characteristic of discharge showed that the lower discharge voltage with higher current was an important feature of RF magnetron sputtering operated near the ESR oscillation,which was caused by the small impedance Z originated from the mutual compensation between the sheath capacitive reactance and the plasma inductive reactance.The higher electron temperature,ion flux density and ion energy as well as the moderate electron density were obtained.The interaction of higher energy ions on substrate surface improved the crystallographic quality of Ag films.Therefore,the 27.12 MHz magnetron sputtering operated near the ESR oscillation has better deposition characteristics than that of commercial 13.56 MHz RF magnetron sputtering. 展开更多
关键词 electron series resonance magnetron sputtering radio-frequency discharge
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Magnetron sputtering NiOx for perovskite solar cells 认领 引用 被引量：1
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作者 Xiangyi Shen Xinwu Ke +2 位作者 Yingdong Xia Qingxun Guo Yonghua Chen 《Journal of Semiconductors》 EI CAS CSCD 2025年第5期48-63,共16页
Perovskite solar cells(PSCs) have become a hot topic in the field of renewable energy due to their excellent power conversion efficiency and potential for low-cost manufacturing. The hole transport layer(HTL), as a ke... Perovskite solar cells(PSCs) have become a hot topic in the field of renewable energy due to their excellent power conversion efficiency and potential for low-cost manufacturing. The hole transport layer(HTL), as a key component of PSCs,plays a crucial role in the cell's overall performance. Magnetron sputtering NiOx has attracted widespread attention due to its high carrier mobility, excellent stability, and suitability for large-scale production. Herein, an insightful summary of the recent progress of magnetron sputtering NiOx as the HTL of PSCs is presented to promote its further development. This review summarized the basic properties of magnetron sputtering NiOx thin film, the key parameters affecting the optoelectronic properties of NiOx thin films during the magnetron-sputtering process, and the performance of the corresponding PSCs. Special attention was paid to the interfacial issues between NiOx and perovskites, and the modification strategies were systematically summarized. Finally, the challenges of sputtering NiOx technology and the possible development opportunities were concluded and discussed. 展开更多
关键词 magnetron sputtering NiOx perovskite solar cells
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Innovative surface modification strategy for ADN:PFOA-interlayered and vibrational magnetron sputtering for constructing anti-hygroscopic composite structures 认领 引用 被引量：1
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作者 Yinan Lyu Xiaoxia Ma +3 位作者 Xiaoting Ren Shuping Sun Lin Shi Li Yang 《Defence Technology（防务技术）》 SCIE EI CAS CSCD 2025年第10期295-305,共11页
Ammonium dinitramide(ADN),as a high-energy oxidizer widely applied in the field of rocket and missile propellants,has a prominent issue of high hygroscopicity due to its strong polarity.The previous coating encapsulat... Ammonium dinitramide(ADN),as a high-energy oxidizer widely applied in the field of rocket and missile propellants,has a prominent issue of high hygroscopicity due to its strong polarity.The previous coating encapsulation methods have struggled to address the problems of uneven coating and polarity mismatch.This research innovatively introduces perfluorooctanoic acid(PFOA)as a polar transition intermediate layer.Utilizing the polarity of one end of it to adsorb on the surface of ADN through hydrogen bonds,the problem of polarity mismatch is effectively overcome.Meanwhile,the vibrational magnetron sputtering process has been first applied in the energetic field,with a special vibrating abutment enhancing ADN particle fluidity to solve coating non-uniformity,thus preparing prilled ADN@PFOA@PTFE core-dual-shell composites.Performance tests reveal that this composite material possesses excellent hydrophobic and anti-hygroscopic properties.When left at 25℃and 75%RH for 3 days,moisture absorption was reduced by more than 90%compared to pure ADN.Simultaneously,its thermal stability,heat release performance,and combustion performance have been improved.The research achievements optimize the storage conditions of ADN in the application of rocket and missile propellants,providing solid support and broad development prospects for technological innovation in military fields. 展开更多
关键词 Ammonium dinitramide(ADN) Vibrational magnetron sputtering Core-dual-shell composites Hydrophobic Polarity matching
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Influence and determinative factors of ion-to-atom arrival ratio in unbalanced magnetron sputtering systems 认领 引用 被引量：11
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作者 Jun Zhou Zhe Wu Zhanhe Liu 《Journal of University of Science and Technology Beijing》 2008年第6期775-781,共7页
Low pressure sputtering with a controlled ratio of ion flux to deposited atom flux at the condensing surface is one of the main directions of development of magnetron sputtering methods.Unbalanced magnetron sputtering... Low pressure sputtering with a controlled ratio of ion flux to deposited atom flux at the condensing surface is one of the main directions of development of magnetron sputtering methods.Unbalanced magnetron sputtering,by producing dense secondary plasma around the substrate,provides a high ion current density.The closed-field unbalanced magnetron sputtering system(CFUBMS)has been established as a versatile technique for high-rate deposition high-quality metal,alloy,and ceramic thin films.The'key factor in the CFUBMS system is the ability to transport high ion currents to the substrate,which can enhance the formation of full dense coatings at relatively low value homologous temperature.The investigation shows that the energy of ions incidenced at the substrate and the ratio of the flux of these ions to the flux of condensing atoms are the fundamental parameters in determining the structure and properties of films produced by ion-assisted deposition processes.Increasing ion bombardment during deposition combined with increasing mobility of the condensing atoms favors the formation of a dense microstructure and a smooth surface. 展开更多
关键词 magnetron sputtering closed-field unbalanced magnetron sputtering system(CFUBMS) ion-to-atom ratio unbalancedmagnetron sputtering
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Magnetron sputter and phase change optimization of waferlevel GeTe films for RF switch 认领 引用
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作者 Shihang Liu Hanxiang Jia +2 位作者 Shuangzan Lu Changyu Hu Jun Liu 《Journal of Semiconductors》 EI CAS CSCD 2025年第7期108-114,共7页
With the rapid advancement of 5G communication technology,increasingly stringent demands are placed on the performance and functionality of phase change switches.Given that RF and microwave signals exhibit characteris... With the rapid advancement of 5G communication technology,increasingly stringent demands are placed on the performance and functionality of phase change switches.Given that RF and microwave signals exhibit characteristics of high frequency,high speed,and high precision,it is imperative for phase change switches to possess fast,accurate,and reliable switching capabilities.Moreover,wafer-level compositional homogeneity and resistivity uniformity during semiconductor manufacturing are crucial for ensuring the yield and reliability of RF switches.By controlling magnetron sputter of GeTe through from four key parameters(pressure,power,Ar flow,and post-annealing)and incorporating elemental proportional compensation in the target,we achieved effective modulation over GeTe uniformity.Finally,we successfully demonstrated the process integration of GeTe phase-change RF switches on 6-inch scaled wafers. 展开更多
关键词 GeTe magnetron sputter phase change in-wafer uniformity RF switch
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Effect of Magnetron Sputtered Gas on Microstructure and Hydrogen Adsorption Performance of ZrCoRE Films 认领 引用
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作者 Zhou Chao Ma Zhanji +2 位作者 Li Gang Yang Lamaocao Zhang Huzhong 《稀有金属材料与工程》 SCIE EI CAS CSCD 北大核心 2025年第6期1451-1456,共6页
ZrCoRE(RE denotes rare earth elements)non-evaporable getter films have significant applications in vacuum packaging of micro-electro mechanical system devices because of their excellent gas adsorption performance,low ... ZrCoRE(RE denotes rare earth elements)non-evaporable getter films have significant applications in vacuum packaging of micro-electro mechanical system devices because of their excellent gas adsorption performance,low activation temperature and environmental friendliness.The films were deposited using DC magnetron sputtering with argon and krypton gases under various deposition pressures.The effects of sputtering gas type and pressure on the morphology and hydrogen adsorption performance of ZrCoRE films were investigated.Results show that the films prepared in Ar exhibit a relatively dense structure with fewer grain boundaries.The increase in Ar pressure results in more grain boundaries and gap structures in the films.In contrast,films deposited in Kr display a higher density of grain boundaries and cluster structures,and the films have an obvious columnar crystal structure,with numerous interfaces and gaps distributed between the columnar structures,providing more paths for gas diffusion.As Kr pressure increases,the film demonstrates more pronounced continuous columnar structure growth,accompanied by deeper and wider grain boundaries.This structural configuration provides a larger specific surface area,which significantly improves the hydrogen adsorption speed and capacity.Consequently,high Ar and Kr pressures are beneficial to improve the adsorption performance. 展开更多
关键词 NEG film magnetron sputtering krypton sputtering pressure hydrogen adsorption performance
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Corrosion resistance of self-healing three-dimensional Ti/Al-doped TiO2nanotubes Ti3AlC2coating deposited by magnetron sputtered on copper 认领 引用
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作者 WANG Guo-qing WANG Ning +5 位作者 HU Yi-teng WANG Jing GAO Chuan-hui WANG Jie XUE Jun-jie YAN Ke-xin 《Journal of Central South University》 SCIE EI CAS CSCD 2025年第3期867-881,共15页
Copper is a versatile material,commonly utilized in power transmission and electronic devices,but its relative high reactivity necessitates a long-lasting protective technique.Here,we report a method that combines pla... Copper is a versatile material,commonly utilized in power transmission and electronic devices,but its relative high reactivity necessitates a long-lasting protective technique.Here,we report a method that combines plasma-enhanced non-equilibrium magnetron sputtering physical vapor deposition(PEUMS-PVD)and anodization to construct a self-healing three-dimensional Ti/Al-doped TiO2nanotubes/Ti3AlC2coating on the surface of Cu substrates.This novel strategy enhances the corrosion resistance of copper substrates in marine environments,with corrosion current densities of up to 4.5643×10−8A/cm2.Among them,the doping of nano-aluminum particles makes the coating self-healing.The mechanistic analysis of the corrosion behaviors during early immersion experiments was conducted using electrochemical noise,and revealed that during the initial stages of coating immersion,uniform corrosion predominates,with a minor occurrence of localized corrosion. 展开更多
关键词 magnetron sputtering TiO2nanotubes Ti3AlC2coating corrosion resistance performance
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Solution for Environmentally Friendly Silver Surface Magnetron Sputtering Color Titanium Film Layer Technology 认领 引用
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作者 Huan Zhu Krisada Daoruang Chalisa Apiwathnasorn 《Journal of Environmental & Earth Sciences》 CAS 2025年第1期562-572,共11页
Silver is an elegant white precious metal,but it is easily oxidized by O3,SO2,and H2S in the air,turning yellow or dark,which affects its decorative effect.The existing silver coating,primarily prepared through the el... Silver is an elegant white precious metal,but it is easily oxidized by O3,SO2,and H2S in the air,turning yellow or dark,which affects its decorative effect.The existing silver coating,primarily prepared through the electroplating process,poses serious environmental pollution problems.It is necessary to seek new,green,and environmentally friendly coating processes while also enhancing the color palette of silver jewelry coatings.Titanium film layers were deposited on Ag925 and Ag999 surfaces using magnetron sputtering coating technology.The effects of sputtering time,substrate surface state,reaction gas type and time,and film thickness on the color of the film layers were studied,and the anti discoloration performance of the obtained film layers under the optimal process was tested.The experimental results show that when the sputtering time varies from 5 to 10 minutes,injecting argon,oxygen,and nitrogen into the coating chamber yields rich colors such as purple with a red tint,blue,yellow green,yellowish purple,and blue purple.The precise control of gas injection time has a significant impact on the color of the film layer.In terms of anti tarnish performance,the film showed good stability in the artificial sweat immersion test.From an environmental perspective,the magnetron sputtering titanium film process has no harmful gas or liquid emissions,which aligns with the sustainable development trend of the jewelry industry and holds great promise for application.This study has improved the visual effect and practical performance of the product,providing important theoretical basis and experimental data support for the application of environmentally friendly silver surface vacuum magnetron sputtering titanium thin film coating technology. 展开更多
关键词 Environmental Protection Magnetron Sputtering Silver Colored Film Titanium Film Layer
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Experimental Demonstration of Multiport Magnetron Units with Specific Power Distribution toward Phased Array Applications 认领 引用
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作者 Da-gui SHEN Liang-jie BI +7 位作者 Yu QIN Pan CUI Xin-yu JIANG Rui GUO Hai-long LI Bin WANG Lin MENG Yong YIN 《真空电子技术》 2025年第3期26-35,共10页
In this paper,three magnetrons with each of them having specifically designed multiple coupling ports,which deliver specific power distribution for developing a magnetron array based on efficient phase locking between... In this paper,three magnetrons with each of them having specifically designed multiple coupling ports,which deliver specific power distribution for developing a magnetron array based on efficient phase locking between them,are proposed to produce high powerμs-level pulses.To demonstrate the effectiveness of the magnetron with one and two coupling ports as a unit for efficient phase locking,we designed experimentally the coupling ports delivering~10%(the power distribution ratio)of the output power of the magnetron for coupling with other magnetron units.The effect of one and two coupling ports on the operating capability,including the power distribution ratio,anode current and frequency,is demonstrated by establishing an equivalent experimental model which can characterize an ideal operation of the array.The experimental results show that the power distribution ratio is~9%for the magnetron with one coupling port,and~12.5%(coupling port 1,2)for the magnetron with two coupling ports.This shows good uniformity of the coupling capability of the two coupling ports and provides guidance for optimizing the power distribution ratio of multiport magnetron units,which are critical for efficient phase locking in the proposed array in future and higher power arrays. 展开更多
关键词 magnetrons phased array high power phase locking vacuum electronics
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Recent Developments in Magnetron Sputtering 认领 引用 被引量：6
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作者 于翔 王成彪 +2 位作者 刘阳 于德洋 邢廷炎 《Plasma Science and Technology》 SCIE EI CAS 2006年第3期337-343,共7页
The principle of magnetron sputtering is introduced andthe balanced and unbalanced magnetrons are compared andthe necessity of unbalanced magnetrons is explained as well. Several recent developments in plasma magnetro... The principle of magnetron sputtering is introduced andthe balanced and unbalanced magnetrons are compared andthe necessity of unbalanced magnetrons is explained as well. Several recent developments in plasma magnetron sputtering, i.e., unbalanced magnetron sputtering, pulsed magnetron sputtering and ion assisted sputtering, are discussed. The recent developments of unbalanced magnetron systems and their incorporation with ion sources result in an understanding in growingimportance of the magnetron sputtering technology, which makes the technology an applicable deposition process for a variety of important films, such as wear-resistant films and decorative films. 展开更多
关键词 balanced and unbalanced magnetron sputtering mid-frequency magnetron sputtering ion assisted sputtering
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Mechanical,Microstructural and Tribological Properties of Reactive Magnetron Sputtered Cr-Mo-N Films 认领 引用 被引量：16
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作者 Dongli Qi Hao Lei +3 位作者 Tiegang Wang Zhiliang Pei Jun Gong Chao Sun 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2015年第1期55-64,共10页
The Cr-Mo-N films were deposited on high speed steel（HSS） substrates by a DC reactive magnetron sputtering equipment coupled with two horizontal magnetron sources.The effects of substrate negative bias voltage（Vb）... The Cr-Mo-N films were deposited on high speed steel（HSS） substrates by a DC reactive magnetron sputtering equipment coupled with two horizontal magnetron sources.The effects of substrate negative bias voltage（Vb）,substrate temperature（Ts） and gas flow ratio（R= N2/（N2+ Ar）） on the microstructure,morphology,as well as the mechanical and tribological properties of the Cr-Mo-N films were investigated by virtue of X-ray diffraction（XRD） analysis,X-ray photoelectron spectroscopy（XPS）,field emission scanning electron microscopy（FESEM）,atomic force microscopy（AFM）,nano-indentation test,ball-on-disk tribometer,and Rockwell indenter et al.With increasing Vbto-100 V,the preferred orientation of the films changed from（111） to（200） and their mechanical and tribological properties were improved gradually,too.It was also found that Tsgave a significant effect on mechanical property enhancement.When the Tsreached 300 ℃,the film obtained the highest hardness and effective elastic modulus of approximately 30.1 and 420.5 GPa,respectively and its critical load increased to about 54 N.With increasing R,the phase transformation from body-centered-cubic（bcc） Cr and hexagonal CrMoNxmultiphase to single face-centered-cubic（fcc） solid solution phase was observed.The correlations between values of hardness（H）,effective elastic modulus（E*）,HIE*,H3/E*2,elastic recovery（1/14） and tribological properties of the films were also investigated.The results showed that the elastic recovery played an important role in the tribological behavior. 展开更多
关键词 Cr-Mo-N films DC magnetron sputtering Hardness Cri
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Influence of Nitrogen Flow Ratio on the Microstructure, Composition, and Mechanical Properties of DC Magnetron Sputtered Zr-B-O-N Films 认领 引用 被引量：14
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作者 Tie-Gang Wang Yanmei Liu +2 位作者 Tengfei Zhang Doo-In Kim KwanKHo Kim 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2012年第11期981-991,共11页
Nanocrystalline ZrB2 film and nanocomposite Zr-B-O-N films were prepared by non-reactive as well as re- active magnetron sputtering techniques, respectively. By means of X-ray diffraction analysis, electron probe micr... Nanocrystalline ZrB2 film and nanocomposite Zr-B-O-N films were prepared by non-reactive as well as re- active magnetron sputtering techniques, respectively. By means of X-ray diffraction analysis, electron probe microanalysis, X-ray photoelectron spectroscopy, and scanning electron microscopy, the influence of nitrogen flow ratio on the film microstructure and characteristics were investigated systematically, including the depo- sition rate, chemical compositions, phase constituents, grain size, chemical bonding, as well as cross-sectional morphologies. Meanwhile, the hardness and adhesion of above films were also evaluated by micro-indentation method and a scratch tester. With increasing the nitrogen flow ratio, the deposition rate of above films de- creased approximately linearly, whereas the contents of N and O in the films increased gradually and tended to saturation. Moreover, the film microstructure was also altered gradually from a fine columnar microstructure to a featureless glass-structure. As the nitrogen flow ratio was 11.7%, the Zr-B-O-N film possessed an typical nanocomposite structure and presented good mechanical properties. During the process of reactive sputtering of metal borides, the introduction of nitrogen can show a pronounced suppression of columnar grain growth and strong nanocomposite structure forming ability. 展开更多
关键词 Films DC magnetron sputtering Nanocomposite Microhardness Adhesion
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Lithium intercalation/de-intercalation behavior of a composite Sn/C thin film fabricated by magnetron sputtering 认领 引用 被引量：8
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作者 ZHAO Lingzhi HU Shejun +2 位作者 LI Weishan LI Liming HOU Xianhua 《Rare Metals》 SCIE EI CAS 2008年第5期507-512,共6页
A tin film of 320 nm in thickness on Cu foil and its composite film with graphite of-50 nm in thickness on it were fabricated by magnetron sputtering. The surface morphology, composition, surface distributions of allo... A tin film of 320 nm in thickness on Cu foil and its composite film with graphite of-50 nm in thickness on it were fabricated by magnetron sputtering. The surface morphology, composition, surface distributions of alloy elements, and lithium intercalation/de-intercalation behaviors of the fabricated films were characterized by X-ray diffraction （XRD）, scanning electron microscopy （SEM）, electron probe microanalyzer （EPMA）, X-ray photoelectron spectroscopy （XPS）, inductively coupled plasma atomic emission spectrometry （ICP）, cyclic voltammetry （CV）, and galvanostatic charge/discharge （GC） measurements. It is found that the lithium intercalation/de-intercalation behavior of the Sn film can be significantly improved by its composite with graphite. With cycling, the discharge capacity of the Sn film without composite changes from 570 mAh/g of the 2nd cycle to 270 mAh/g of the 20th cycle, and its efficiency for the discharge and charge is between 90% and 95%. Nevertheless, the discharge capacity of the composite Sn/C film changes from 575 mAh/g of the 2nd cycle to 515 mAh/g of the 20th cycle, and its efficiency for the discharge and charge is between 95% and 100%. The performance improvement of tin by its composite with graphite is ascribed to the retardation of the bulk tin cracking from volume change during lithium intercalation and de-intercalation, which leads to the pulverization of tin. 展开更多
关键词 lithium-ion battery anode magnetron sputtering composite film lithium intercalation/de-intercalation
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Influence of oxygen gas content on the structural and optical properties of ZnO thin films deposited by RF magnetron sputtering at room temperature 认领 引用 被引量：6
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作者 LIU Baoting ZHOU Yang +4 位作者 ZHENG Hongfang LI Mana GUO Zhe HAO Qingxun PENG Yingcai 《Rare Metals》 SCIE EI CAS CSCD 2011年第2期170-174,共5页
Zinc oxide （ZnO） thin films were deposited on sapphire （0001） substrates at room temperature by radiofrequency （RF） magnetron sputtering at oxygen gas contents of 0%, 25%, 50% and 75%, respectively. The influenc... Zinc oxide （ZnO） thin films were deposited on sapphire （0001） substrates at room temperature by radiofrequency （RF） magnetron sputtering at oxygen gas contents of 0%, 25%, 50% and 75%, respectively. The influence of oxygen gas content on the structural and optical properties of ZnO thin films was studied by a surface profile measuring system, X-ray diffraction analysis, atomic force microscopy, and UV spectro- photometry. It is found that the size of ZnO crystalline grains increases first and then decreases with the increase of oxygen gas content, and the maximum grain size locates at the 25% oxygen gas content. The crystalline quality and average optical transmittance （〉90%） in the visi- ble-light region of the ZnO film prepared at an oxygen gas content of 25% are better than those of ZnO films at the other contents. The obtained results can be attributed to the resputtefing by energetic oxygen anions in the growing process. 展开更多
关键词 thin films zinc oxide magnetron sputtering oxygen structural properties optical properties
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Effect of Nitrogen Content on Microstructures and Mechanical Properties of WB_2(N) Films Deposited by Reactive Magnetron Sputtering 认领 引用 被引量：7
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作者 Y.M.Liu D.Y.Deng +4 位作者 H.Lei Z.L.Pei C.L.Jiang C.Sun J.Gong 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2015年第12期1217-1225,共9页
In the present study,WB 2（N） films are fabricated on silicon and YG8 substrates at different N 2 pressures by reactive magnetron sputtering.The influence of N 2 partial pressure（P （N2）） on the film microstructur... In the present study,WB 2（N） films are fabricated on silicon and YG8 substrates at different N 2 pressures by reactive magnetron sputtering.The influence of N 2 partial pressure（P （N2）） on the film microstructure and characteristics is studied systematically,including the chemical composition,crystalline structure,residual stress,surface roughness as well as the surface and the cross-section morphology.Meanwhile,nano-indentation and ball-on-disk tribometer are performed to analyze the mechanical and tribological properties of the films.The results show that the addition of nitrogen apparently leads to the change of the structure from（1 0 1） to（0 0 1） orientation then to the amorphous structure with the formation of BN phase.And the addition of nitrogen can greatly refine the grain size and microstructure of the films.Furthermore,the residual stress of the film is also found to change from tensile to compressive stress as a function of P （N2）,and the compressive stress increases with P （N2）,The WB 2（N） films with small nitrogen content,which are deposited at P （N2） of 0.004 and 0.006 Pa,exhibit better mechanical,tribological and corrosion properties than those of other films.Further increase of nitrogen content accelerates the formation of BN phase and fast decreases the film hardness.In addition,the large N 2 partial pressure gives rise to the target poisoning accompanied by the increase of the target voltage and the decrease of the deposition rate. 展开更多
关键词 Reactive magnetron sputtering Nanocomposites WB 2（N） films Residual stress Mechanical properties
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Magnetic properties and microstructures of terbium coated and grain boundary diffusion treated sintered Nd-Fe-B magnets by magnetron sputtering 认领 引用 被引量：17
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作者 Wei Zhu Yang Luo +3 位作者 Zilong Wang Xinyuan Bai Haijun Peng Dunbo Yu 《Journal of Rare Earths》 SCIE EI CAS CSCD 2021年第2期167-173,共7页
Tb coating on the surface of commercial sintered Nd-Fe-B magnet was prepared by DC magnetron sputtering.The secondary heat treatment was used to regulate the microstructure for the enhancement of coercivity,namely dif... Tb coating on the surface of commercial sintered Nd-Fe-B magnet was prepared by DC magnetron sputtering.The secondary heat treatment was used to regulate the microstructure for the enhancement of coercivity,namely diffusion treatment and annealing treatment.The coercivity increases significantly from 18.3 to 28.0 kOe,the remanence decreases slightly from 14.1 to 14.0 kGs,and the comprehensive magnetic properties are higher than 75(Hcj+(BH)max=76.7).SEM results indicate that,on the one hand,950℃is the optimal diffusion temperature.Lower diffusion temperature results in insufficient diffusion of Tb element.Higher diffusion temperature can lead to the main phase grain growth,the decrease of Nd-rich phase,and forming holes in the magnet.On the other hand,500℃is the optimal annealing temperature.Lower annealing temperature can result in the reduction of Nd-rich phase.Higher annealing temperature can generate the non-defined Nd-rich thin layer between grains. 展开更多
关键词 Sintered Nd-Fe-B magnets Magnetron sputtering Tb coating Magnetic properties Rare earths
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Preparation of Ti_2AlC MAX Phase Coating by DC Magnetron Sputtering Deposition and Vacuum Heat Treatment 认领 引用 被引量：13
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作者 Zongjian Feng Peiling Ke Aiying Wang 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2015年第12期1193-1197,共5页
Due to the excellent corrosion resistance and high irradiation damage resistance,Ti 2AlC MAX phase is considered as a candidate for applications as corrosion resistant and irradiation resistant protective coating.MAX ... Due to the excellent corrosion resistance and high irradiation damage resistance,Ti 2AlC MAX phase is considered as a candidate for applications as corrosion resistant and irradiation resistant protective coating.MAX phase coatings can be fabricated through firstly depositing a coating containing the three elements M,A,and X close to stoichiometry of the MAX phases using physical vapor deposition,followed by heat treatment in vacuum.In this work,Ti-Al-C coating was prepared on austenitic stainless steels by reactive DC magnetron sputtering with a compound Ti （50）Al （50） target,and CH4 used as the reactive gas.It was found that the as-deposited coating is mainly composed of Ti 3AlC antiperovskite phase with supersaturated solid solution of Al.Additionally,the ratio of Ti/Al remained the same as that of the target composition.Nevertheless,a thicker thermally grown Ti 2AlC MAX phase coating was obtained after being annealed at 800℃ in vacuum for 1 h.Meanwhile,the ratio of Ti/Al became close to stoichiometry of Ti 2AlC MAX phases.It can be understood that owing to the higher activity of Al,it diffused quickly into the substrate during annealing,and then more stable Ti 2AlC MAX phases transformed from the Ti 3AlC antiperovskite phase. 展开更多
关键词 Ti2AlC MAX phase Coating Magnetron sputtering Microstructure
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