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BiVO4/TiO2(N2) Nanotubes Heterojunction Photoanode for Highly Efficient Photoelectrocatalytic Applications 认领 引用 被引量：8
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作者 Rui Wang Jing Bai +3 位作者 Yunpo Li Qingyi Zeng Jinhua Li Baoxue Zhou 《Nano-Micro Letters》 SCIE EI CAS 2017年第2期14-22,共9页
We report the development of a novel visible response BiVO_4/TiO_2(N_2) nanotubes photoanode for photoelectrocatalytic applications. The nitrogen-treated TiO_2 nanotube shows a high carrier concentration rate, thus re... We report the development of a novel visible response BiVO_4/TiO_2(N_2) nanotubes photoanode for photoelectrocatalytic applications. The nitrogen-treated TiO_2 nanotube shows a high carrier concentration rate, thus resulting in a high efficient charge transportation and low electron–hole recombination in the TiO_2–BiVO_4. Therefore, the BiVO_4/TiO_2(N_2) NTs photoanode enabled with a significantly enhanced photocurrent of 2.73 mA cm-2(at 1 V vs. Ag/Ag Cl) and a degradation efficiency in the oxidation of dyes under visible light. Field emission scanning electron microscopy, X-ray diffractometry, energy-dispersive X-ray spectrometer, and UV–Vis absorption spectrum were conducted to characterize the photoanode and demonstrated the presence of both metal oxides as a junction composite. 展开更多
关键词 BiVO4 TiO2(N2) nanotube Heterojunction Photoelectrocatalytic Degradation of dyes
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纳米Cu^2+/TiO2抗菌膜对禽流感病毒(H9N2)的灭活效应 认领 引用 被引量：2
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作者 姜建芳 崔海信 +2 位作者 杨涛 蔡鸿昌 吴东来 《功能材料》 EI CAS 北大核心 2009年第8期1403-1406,共4页
利用病毒滴度测定和MDCK细胞电镜观察法,初步探讨了在365nm的黑光灯(UV)照射下,纳米Cu2+/TiO2抗菌膜对禽流感病毒(H9N2)的光催化灭活效应,并分别考察了UV强度、UV照射时间以及H9N2病毒量对H9N2病毒光催化灭活效应的影响。实验结果表明,... 利用病毒滴度测定和MDCK细胞电镜观察法,初步探讨了在365nm的黑光灯(UV)照射下,纳米Cu2+/TiO2抗菌膜对禽流感病毒(H9N2)的光催化灭活效应,并分别考察了UV强度、UV照射时间以及H9N2病毒量对H9N2病毒光催化灭活效应的影响。实验结果表明,在365nm黑光灯的照射下,纳米Cu2+/TiO2抗菌膜对H9N2病毒具有显著的灭活效应,在UV强度为0.5mW/cm2、UV照射时间为2.5h、病毒量为0.1ml时,H9N2病毒的灭活率达到了100%。研究结果表明,纳米Cu2+/TiO2抗菌膜在抑制禽流感(H9N2)病毒在环境媒介中的扩散与传播方面有潜在的应用价值。 展开更多
关键词 Cu^2+/TiO2 禽流感病毒(H9N2) 光催化 灭活效应
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氮气流量对磁控溅射C掺杂TiO2薄膜光学性能的影响 认领 引用 被引量：1
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作者 江耀华 沈鸿烈 高凯 《半导体光电》 CAS 北大核心 2020年第3期351-356,共6页
采用磁控溅射法制备了C掺杂TiO2薄膜,并研究了氮气引入溅射过程对薄膜光学性能的影响。利用X射线衍射仪、拉曼光谱仪、X射线光电子能谱仪、分光光度计和原子力显微镜分析了不同氮气流量下薄膜的微结构、元素价态、透光性能和表面形貌。... 采用磁控溅射法制备了C掺杂TiO2薄膜,并研究了氮气引入溅射过程对薄膜光学性能的影响。利用X射线衍射仪、拉曼光谱仪、X射线光电子能谱仪、分光光度计和原子力显微镜分析了不同氮气流量下薄膜的微结构、元素价态、透光性能和表面形貌。结果表明,沉积的薄膜主要是非晶结构,拉曼光谱中存在少量锐钛矿相,且随着氮气流量增大,锐钛矿特征峰强度减弱,意味着晶粒出现细化。当氮气流量增大为4cm3/min时,C掺杂TiO2薄膜内氮元素含量为3.54%,其光学带隙从3.29eV变化至3.55eV,可见光区的光学透过率明显提高。可见改变氮气流量可实现对C掺杂TiO2薄膜光学带隙和光吸收率的有效调控。 展开更多
关键词 C掺杂TiO2 氮气流量 磁控溅射 透过率 光学带隙
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NH_3-SCR denitration catalyst performance over vanadium–titanium with the addition of Ce and Sb 认领 引用 被引量：23
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作者 Chi Xu Jian Liu +5 位作者 Zhen Zhao Fei Yu Kai Cheng Yuechang Wei Aijun Duan Guiyuan Jiang 《Journal of Environmental Sciences》 SCIE EI CAS CSCD 2015年第5期74-80,共7页
Selective catalytic reduction technology using NH3 as a reducing agent（NH3-SCR） is an effective control method to remove nitrogen oxides. TiO2-supported vanadium oxide catalysts with different levels of Ce and Sb mo... Selective catalytic reduction technology using NH3 as a reducing agent（NH3-SCR） is an effective control method to remove nitrogen oxides. TiO2-supported vanadium oxide catalysts with different levels of Ce and Sb modification were prepared by an impregnation method and were characterized by X-ray diffractometer（XRD）, Brunauer-Emmett-Teller（BET）, Transmission electron microscopy（TEM）, Fourier transform infrared spectroscopy（FT-IR）, UV-Vis diffuse reflectance spectroscopy（UV-Vis DRS）, Raman and Hydrogen temperature-programmed reduction（H2-TPR）. The catalytic activities of V5 CexS by/TiO2 catalysts for denitration were investigated in a fixed bed flow microreactor. The results showed that cerium, vanadium and antimony oxide as the active components were well dispersed on TiO2, and the catalysts exhibited a large number of d-d electronic transitions, which were helpful to strengthen SCR reactivity. The V5 CexS by/TiO2 catalysts exhibited a good low temperature NH3-SCR catalytic activity. In the temperature range of 210 to 400℃, the V5 CexS by/TiO2 catalysts gave NO conversion rates above 90%. For the best V5Ce35Sb2/TiO2 catalyst, at a reaction temperature of 210℃, the NO conversion rate had already reached 90%. The catalysts had different catalytic activity with different Ce loadings. With the increase of Ce loading, the NO conversion rate also increased. 展开更多
关键词 VCeSb/TiO2 catalyst SCR Denitration Low temperature N2 selectivity
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Dehydroxylation action on surface of TiO_2 films restrained by nitrogen carrier gas during atomic layer deposition process 认领 引用
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作者 Zhi-Peng Rao Bang-Wu Liu +2 位作者 Chao-Bo Li Yang Xia Jun Wan 《Rare Metals》 SCIE EI CAS CSCD 2014年第5期583-586,共4页
A strong influence of nitrogen gas on the content of surface hydroxyl groups of TiO2 films by atomic layer deposition（ALD） was investigated by X-ray photoelectron spectroscopy（XPS）, contact angle measuring system,... A strong influence of nitrogen gas on the content of surface hydroxyl groups of TiO2 films by atomic layer deposition（ALD） was investigated by X-ray photoelectron spectroscopy（XPS）, contact angle measuring system, and UV–Vis spectrophotometer. XPS spectra of O 1s indicate that the content of surface hydroxyl groups is varied when using N2 as carrier gas. The results of water contact angles and optical reflection spectra show that the content variation of surface hydroxyl groups influences the wetting properties and optical reflectivity of TiO2 films. A surface reaction model is suggested to explain the ALD reaction process using N2 as carrier gas. 展开更多
关键词 Atomic layer deposition TiO2 N2 Surface hydroxyl groups XPS Reaction model
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响应[N(NH_3)_3]气体TiO_2敏感材料低阻化研究 认领 引用
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作者 艾玉杰 裴素华 《微纳电子技术》 CAS 2005年第6期277-279,共3页
通过N2气氛高温退火、Nb2O5掺杂和采用梳状电极结构等方法,成功提高了TiO2基敏感材料的电导率。实验证明,降低氧分压可增强TiO2自身半导化程度;掺入10%左右Nb2O5,Nb5+替代Ti4+形成固溶体,可使TiO2得到最佳半导化效果;采用梳状电极结构,... 通过N2气氛高温退火、Nb2O5掺杂和采用梳状电极结构等方法,成功提高了TiO2基敏感材料的电导率。实验证明,降低氧分压可增强TiO2自身半导化程度;掺入10%左右Nb2O5,Nb5+替代Ti4+形成固溶体,可使TiO2得到最佳半导化效果;采用梳状电极结构,可以在一定程度上减小器件阻值,从而为制造低阻、高灵敏度、高选择性动物食品测鲜传感器开辟了一条新途径。 展开更多
关键词 二氧化钛 N2退火 Nb^5+掺杂 低阻化
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