Chrome-doped titanium oxide films were prepared by reactive magnetron sputtering method.The films deposited on glass slides at room temperature were investigated by atom force microscope,X-ray diffractometer,X-ray pho...Chrome-doped titanium oxide films were prepared by reactive magnetron sputtering method.The films deposited on glass slides at room temperature were investigated by atom force microscope,X-ray diffractometer,X-ray photoelectron spectroscopy,UV-Vis spectrophotometer,the photoluminescence(PL)and ellipse polarization apparatus.The results indicate that TiO2-Cr film exists in the form of amorphous.The prepared films possess a band gap of less than 3.20 eV,and a new absorption peak.The films,irradiated for 5 h under UV light,exhibit excellent photocatalytic activities with the optimum decomposition rate at 98.5%for methylene blue.Consequently,the thickness threshold on these films is 114 nm,at which the rate of photodegradation is 95%in 5 h.When the thickness is over 114 nm,the rate of photodegradation becomes stable.This result is completely different from that of crystalloid TiO2 thin film.展开更多
摘要Chrome-doped titanium oxide films were prepared by reactive magnetron sputtering method.The films deposited on glass slides at room temperature were investigated by atom force microscope,X-ray diffractometer,X-ray photoelectron spectroscopy,UV-Vis spectrophotometer,the photoluminescence(PL)and ellipse polarization apparatus.The results indicate that TiO2-Cr film exists in the form of amorphous.The prepared films possess a band gap of less than 3.20 eV,and a new absorption peak.The films,irradiated for 5 h under UV light,exhibit excellent photocatalytic activities with the optimum decomposition rate at 98.5%for methylene blue.Consequently,the thickness threshold on these films is 114 nm,at which the rate of photodegradation is 95%in 5 h.When the thickness is over 114 nm,the rate of photodegradation becomes stable.This result is completely different from that of crystalloid TiO2 thin film.