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Hole-pillar coupled structure:a universal design model for two-dimensional gratings fabricated by dual-beam interference lithography 认领 引用
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作者 RUIPENG WANG YUQI SUN +3 位作者 XINYU WANG WENHAO LI ZHAOWU LIU YANXIU JIANG 《Photonics Research》 SCIE EI CAS CSCD 2026年第1期22-34,共13页
Dual-beam interference lithography is a core technology for two-dimensional(2D)grating fabrication.However,significant morphological deviations occur between the fabricated structures and traditional theoretical model... Dual-beam interference lithography is a core technology for two-dimensional(2D)grating fabrication.However,significant morphological deviations occur between the fabricated structures and traditional theoretical models,causing diffraction efficiency prediction discrepancies.To address this issue,this paper proposes a hole–pillar coupled design model for 2D gratings fabricated via dual-beam interference lithography.By constructing the actual three-dimensional(3D)grating morphology,the proposed model describes the grating profile evolution during fabrication accurately.Using an inverse grating design method based on the Fourier modal method,a polarization-independent 2D grating structure with high diffraction efficiency was optimized for a 670 nm working wavelength.A 2D grating with a line density of 1200 gr/mm was fabricated using dual-beam interference lithography.Experimental results show that,when transverse electricransverse magnetic-polarized light at 670 nm is perpendicularly incident,the diffraction efficiency of the(±1,0)and(0,±1)orders exceeds 20%,with a polarization imbalance of less than 3%.Atomic force microscopy characterization reveals a correlation coefficient of 0.988 between the actual and designed grating structures,verifying the proposed model's accuracy.The model provides a precise description of the groove profile in 2D holographic gratings,expands the grating fabrication tolerance,and provides a theoretical foundation for the development of next-generation nanoscale-precision multi-degree-of-freedom measurement systems. 展开更多
关键词 hole pillar coupled design model two dimensional gratings hole pillar coupled structure diffraction efficiency fabricated structures traditional theoretical modelscausing morphological deviations dual beam interference lithography
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